Fraenkel Gallery and David Zwirner are pleased to participate in ADAA: The Art Show 2019 with a joint presentation of works by Diane Arbus (1923–1971) and Alice Neel (1900–1984). This collaborative installation, on view at the Park Avenue Armory in New York from February 28–March 3, 2019, explores the unmistakable affinities between the two artists. Although they were simultaneously creating some of their most consequential work not far from each other, in New York City, there is no evidence that they ever met.
Neel and Arbus, both rogues in their own time, are now widely regarded as two of the foremost artists of the twentieth century. Neel chose her subjects largely from her milieu—family, friends, and other acquaintances—while Arbus more often sought out hers by exploring unfamiliar territories, many times building on chance encounters.
Neel’s paintings and Arbus’s photographs share a palpable intensity and complexity, and there is frequently an uncanny resonance between their portraits. The gaze and the gravity that each artist was able to conjure is magnified and even clarified by bringing them together in this presentation. The juxtaposition of the two artists’ work exposes an astonishing kinship that intensifies the idiosyncratic qualities of each.
Fraenkel Gallery: Booth B5 | David Zwirner: Booth A6